Publication

Byline

Location

US Patent Issued to Huttlin on Oct. 6 for "Method and apparatus for recognizing a fault state of a machine or of a process" (German Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,105, issued on Oct. 6, was assigned to Huttlin GmbH (Schopfheim, Germany). "Method and apparatus for recognizing a fault state of a machine ... और पढ़ें


US Patent Issued to LEICA MIKROSYSTEME on Oct. 6 for "Method for producing a section ribbon from a sample block using a microtome, method for preparing a microscopic sample for examination in an electron microscope, microtome and embedding mould for use therein" (Austrian Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,106, issued on Oct. 6, was assigned to LEICA MIKROSYSTEME GMBH (Vienna). "Method for producing a section ribbon from a sample block using a ... और पढ़ें


US Patent Issued to LockCon on Oct. 6 for "Sample taking device, sample taking system and method of operating a sample taking device" (Swiss Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,107, issued on Oct. 6, was assigned to LockCon AG (Wil, Switzerland). "Sample taking device, sample taking system and method of operating a ... और पढ़ें


US Patent Issued to FEI on Oct. 6 for "Systems and methods for accurate layer detection and analysis in charged particle microscopes" (Czech Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,108, issued on Oct. 6, was assigned to FEI Co. (Hillsboro, Ore.). "Systems and methods for accurate layer detection and analysis in charged ... और पढ़ें


US Patent Issued to AIXTRON on Oct. 6 for "Gas inlet element of a CVD reactor with two infeed points" (Belgian Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,505, issued on Oct. 6, was assigned to AIXTRON SE (Herzogenrath, Germany). "Gas inlet element of a CVD reactor with two infeed points" was i... और पढ़ें


US Patent Issued to JUSUNG ENGINEERING on Oct. 6 for "Substrate processing device and method for cleaning substrate processing device" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,506, issued on Oct. 6, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea). "Substrate processing device and method for cleaning subst... और पढ़ें


US Patent Issued to Tokyo Electron on Oct. 6 for "Substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,507, issued on Oct. 6, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing apparatus" was invented by Tatsuya Yamaguchi (Nira... और पढ़ें


US Patent Issued to PlayNitride Display on Oct. 6 for "Heating apparatus and chemical vapor deposition system" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,508, issued on Oct. 6, was assigned to PlayNitride Display Co. Ltd. (MiaoLi County, Taiwan). "Heating apparatus and chemical vapor depositio... और पढ़ें


US Patent Issued to General Electric on Oct. 6 for "Chemical vapor deposition during additive manufacturing" (Ohio Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,509, issued on Oct. 6, was assigned to General Electric Co. (Schenectady, N.Y.). "Chemical vapor deposition during additive manufacturing" w... और पढ़ें


US Patent Issued to UCHICAGO ARGONNE on Oct. 6 for "Calorimetry method to measure chemical reaction heat in ALD/ALE processes using temperature-sensitive resistance coatings" (Illinois Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,510, issued on Oct. 6, was assigned to UCHICAGO ARGONNE LLC (Chicago). "Calorimetry method to measure chemical reaction heat in ALD/ALE proc... और पढ़ें